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BARCsbCMPbdeveloperbphotoresistbstrippers
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Dongjin's thinners and strippers for photoresists
provide processing choices and performance advantages over current
industry standards. Thinner products provide world-class edge bead
removal while complying with industry standards for purity, packaging
and environmental protection. Thinners and strippers are used to
remove excess photoresists and residues after the etching stage
of substate.
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1) STRIPPER
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1.DPSS-3010FSemi-aqueous Stripper for removal of post
etch residues
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DPSS-4020N effectively removes positive photoresists
as well as post-etch residues associated with high-energy plasma
etchers and ashers. It shows excellent compatibility with los-k
dielectric materials and metals such as TiN, Al.
¦ DPSS-4020N is recommended for hard post-etch residue removal.
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Characteristics
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- Rapid Removal of Post Etch Residue and other Inorganic Residues
- Low Processing Temperature
- Short Processing Time
- Excellent Miscibility with Water
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2.Dpss-4020NFSemi-aqueous Stripper for removal of
post etch resdues
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DPSS-5000 is a highly effective acid-based stripper
with performance like other commercially available product and it
is excellent for use with single wafer spray tools.
¦ DPSS-5000 is recommended for general post-etch residue removal
and used with single wafer spray tools.
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Characteristics
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- Acid-based Stripper
- Effectively Remove Post-Etch Residues
- Low Corrosive to Meal ( Al, TiN, W )
- Completely Water Soluble
- Compatible with Low-k Material
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2) THINNER
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1.DPT-PJ4FThinner for EBR back side ninsing
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DPT-PJ4 is a photoresist thinner for EBR, back side
rinsing and line flushing process.
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Characteristics
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- Superior EBR profile in g-line, I-line KrF, ArF photoresist,
BARC, SOG (FOX, T-12)
- Excellent Dissolution Rate
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SEMICONDUCTOR TOPΦ
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